Electron Beam Lithography - Drawing Images with Electrons

Explore the fascinating world of Electron Beam Lithography in this 25-minute video. Learn about drawing images with electrons using a scanning electron microscope. Discover the intricacies of substrate selection, PMMA resist application, and the working principles of e-beam resists. Delve into the development process and analyze results, examining factors such as dose dependence, resist thickness, substrate properties, and accelerating voltage. Understand the proximity effect, emission current, and the differences between SEM and EBL. Investigate fast beam blankers and the distinction between positive and negative PMMA dosing. Conclude with insights on future steps and a glimpse at the Curiosity Rover Wheel design.

Intro
Electron Beam Lithography
Substrate Choice
PMMA Resist
How do e-beam resists work?
Development
Results!
Dose Dependence
Resist Thickness
Substrate
Accelerating Voltage
Proximity Effect
Emission Current
SEM vs EBL
Fast Beam Blanker
PMMA dosing - Positive vs Negative resist
Next Steps
Curiosity Rover Wheel!